Ag/Au Alloy LSPR Engineering by Co-deposition of RF-Sputtering and RF-PECVD

A STUDY OF TiAlN COATINGS PREPARED BY RF CO-SPUTTERING

Using the reactive magnetron rf co-sputtering technique and a Ti target partially covered with a small Al plate, TiAlN coatings were made on c-Si in a reactive atmosphere of nitrogen and argon. Coatings were deposited on substrates at 22°C and at 150°C. The substrate temperature notably affected the thickness, crystalline grain size, and hardness of the coatings. We analyzed the dependence of b...

Rf sputtering technique pdf

Deposition and characterization of silicon carbon nitride films prepared by RF-PECVD with capacitive coupling

The goals of this work were to synthesize stoichiometric silicon carbon nitride (Si1.5C1.5N4) films using the RF-PECVD method and to characterize the deposited material. Gas mixtures, as opposed to an organic monomer, were chosen for reactants. Gas mixtures allow for varying the concentration of the elements needed for silicon carbon nitride synthesis and thereby optimizing the composition of t...

اثر زمان انباشت در تغییر ساختار نانوذرات نقره ساخته شده در بستری از کربن شبه‌الماسی به‌ روش RF-PECVD

Silver nanoparticles embedded in DLC matrix, were prepared by co-deposition of RF-Sputtering and RF-PECVD method from acetylene gas and sliver target. The RF power and initial pressure of chamber were fixed. Variations of morphology, optical and electrical properties of these films over time were investigated

Magnetic-Field Induced Strains in Ferromagnetic Shape Memory Alloy Ni55Mn23Ga22 Deposited by RF-Magnetron Sputtering

1.5mm–Ni55Mn23Ga22 ferromagnetic thin films were deposited onto silicon substrates and silicon single beam cantilever using radio-frequency magnetron sputtering. As-deposited sample and heat-treated thin films were studied on their silicon substrates and peeled off to determine the influence of the stress. Post-heat treatment process allows at the films to achieve the shape memory effect (SME)....